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Wonwoo Lee(presenting), Jeong Min Shin, Min Seok Jang

School of Electrical Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon 34141, Korea

Diffraction efficiency optimization of fourier grating structure

Although optical patterned surfaces were used for a long time, their fabrications were mostly focused on binary gratings because the current methods of fabrication were primarily relying on lithographic photochemical reactions and etchings. However, recent research suggests that scanning probe lithography could be used for fabricating optical fourier surfaces. So this study’s goal is to maximize the 1st order Diffraction efficiencies of transitted waves, by using the optical fourier surfaces.

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